PECVD

Advantages of PECVD:

• Versatility: Deposition of various functional thin films at low temperatures, suitable for diverse applications.

• Uniform Deposition: Plasma treatment ensures homogeneous thin film deposition with high quality and smooth surfaces.

• Rapid Deposition: Fast film formation, ideal for large-area coating.

• Low-temperature Process: Conducted at reduced temperatures to minimize thermal stress on substrates.

• Complex Structures: Enables intricate thin film designs, enhancing photovoltaic device performance and stability.